Our story-Sputtering Equipment Target Company【UCSM Technology Corp.】Sputtering process processing

UCSM Technology Corp.

Our story

UCSM Technology Corp.
is a startup dedicated to providing solutions for the sputtering target industry. Our vision is to become the most advanced provider of plasma processing technology and target industry services, connecting target manufacturers and users to become the most competitive team in the sputtering coating industry and a valuable international enterprise in the supply chain.

Since its inception, UCSM has gradually expanded the possible applications of plasma, developed various plasma equipment, and provided solutions to various plasma-related engineering problems. Our innovative technology enables customers to take a leading position in the industry. The main technologies currently applied in the sputtering industry are:

Ultra-Clean Surface Machining Technology (UCSM)

To solve the problems of target surface contamination and damage caused by traditional processing, we achieve the effects of removing damage, contamination, particles, and oxidation, enabling target users to obtain better target quality and sputtering film yield.

Comprehensive Target Testing Technology (STC)

With expertise in target and sputtering, UCSM provides this technology and service to accelerate target development for target manufacturers, promote product innovation, and allow target users to preview target sputtering characteristics before placing them on production equipment.

Co-Sputtering System for Alloy Film Development (CST)

UCSM independently developed this co-sputtering system, which enables rapid development of various component alloy films. We continue to cooperate with industry and research units in the field of thin film materials to explore and develop.




Company Information

  • ADD:No.31, Gongye 2nd Rd., Annan Dist., Tainan City 709410, Taiwan (R.O.C.) R3101
  • TEL:+886-6-3842805
  • MOB:
  • FAX:
  • EMAIL:ucsm@ucsm.com.tw
  • Tax ID number:64899661

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The sputtering target material provides good film characteristics and sputtering process efficiency, which helps to control the quality of the disc. In addition, the sputtering equipment's cleanliness, crystal image uniformity and recycling system for sputtering targets, as well as related integrated technology and quality services. Different sputtering equipment power supplies can provide different deposition methods and process speeds.