Sputtering Target Characterization service-Sputtering Equipment Target Company【UCSM Technology Corp.】Sputtering process processi

UCSM Technology Corp.

Sputtering Equipment Target Company【UCSM Technolog

Sputtering Target Characterization service

Sputtering Target Characterization, test items:

  • Appearance Inspection of the sputtering surface of the target

  • The number of particles and the number of abnormal discharge behaviors of plasma(Arcing)

  • Sputtering current and voltage characteristic curve

  • Target sputtering/film uniformity 

  • Target utilization rate

  • Target scattering angle

  • Thin film characteristics

  • Other inspection items required by customers

Other information

  • Tax ID number 64899661

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Company Information

  • ADD:No.31, Gongye 2nd Rd., Annan Dist., Tainan City 709410, Taiwan (R.O.C.) R2107
  • TEL:+886-6-3842805
  • MOB:
  • FAX:
  • EMAIL:ucsm.tech@gmail.com
  • Tax ID number:64899661

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The sputtering target material provides good film characteristics and sputtering process efficiency, which helps to control the quality of the disc. In addition, the sputtering equipment's cleanliness, crystal image uniformity and recycling system for sputtering targets, as well as related integrated technology and quality services. Different sputtering equipment power supplies can provide different deposition methods and process speeds.