Thin film thickness and component XRF analysis

UCSM Technology Corp.

Thin film thickness and component XRF analysis

Film XRF Thickness and Composition Analysis Service

X-ray fluorescence spectroscopy (XRF) is a non-destructive chemical analysis technique that can quickly and accurately determine the types and amounts of elements in a sample. The technique is based on the principle that when a sample is irradiated with X-rays, the atoms in the sample are excited and emit X-ray fluorescence spectra. XRF analysis instruments typically include an X-ray generator, sample stage, X-ray fluorescence counter, and spectrum analyzer. The specific operation process is to place the sample on the sample stage, generate a beam of high-energy X-rays with the X-ray generator, irradiate the sample surface, and collect and convert the fluorescence X-rays through the fluorescence counter. Then, the fluorescence X-rays enter the spectrum analyzer for analysis. The spectrum analyzer separates the fluorescence X-rays by energy, measures their intensity and energy, and determines the types and amounts of elements represented by the fluorescence X-rays. The energy of fluorescence X-rays for each element is fixed, so by measuring the energy and intensity of fluorescence X-rays, information on the types and amounts of elements in the sample can be obtained. XRF analysis has the advantages of fast analysis speed, high accuracy, and no sample pre-treatment, and is widely used in fields such as metallurgy, mining, materials science, and environmental monitoring.

XRF Film Analysis





Company Information

  • ADD:No.31, Gongye 2nd Rd., Annan Dist., Tainan City 709410, Taiwan (R.O.C.) R3101
  • TEL:+886-6-3842805
  • MOB:
  • FAX:
  • Tax ID number:64899661

©Copyright All Rights Reserved UCSM Technology Crop.

Design By : Apple Web Design
The sputtering target material provides good film characteristics and sputtering process efficiency, which helps to control the quality of the disc. In addition, the sputtering equipment's cleanliness, crystal image uniformity and recycling system for sputtering targets, as well as related integrated technology and quality services. Different sputtering equipment power supplies can provide different deposition methods and process speeds.