Alloy thin film development

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Alloy thin film development

Collaborative Development of Thin Film Alloys


Do you have great ideas or a need for alloy thin films, but struggle with the high cost of developing thin films? Our coating outsourcing service is your best choice! Our coating technology uses 2-inch or 3-inch targets, and can easily achieve coating over an 8-inch wafer range to meet all your various needs. Additionally, we can provide alloy composition film development services based on your desired film characteristics, allowing you to achieve alloy thin film development quickly and at a low cost, making it easier for you to carry out various alloy thin film research and development. Contact us now and let us provide you with the highest quality coating outsourcing services for your products!

 

Join hands with us at UCSM Technology for collaboration on:


Government project commission
Academic research commission
Functional thin film composition development commission

 

Actual case studies of thin film alloy development

  

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  • Tax ID number：64899661

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The sputtering target material provides good film characteristics and sputtering process efficiency, which helps to control the quality of the disc. In addition, the sputtering equipment's cleanliness, crystal image uniformity and recycling system for sputtering targets, as well as related integrated technology and quality services. Different sputtering equipment power supplies can provide different deposition methods and process speeds.